Traditional IC pattern-generation methods focus on detectingdefects at gate terminals or at interconnects. Unfortunately, a significantpopulation of defects may occur within an IC's gates, or cells.

Semiconductor wafer defect pattern recognition and classification is a crucial area of research that underpins yield enhancement and quality assurance in microelectronics manufacturing. The discipline ...

San Francisco, CA. KLA-Tencor chose SEMICON West to announce four new systems—the 2920 Series, the Puma 9850, the Surfscan SP5, and the eDR-7110. The systems are designed to address IC manufacturing ...

To view the multimedia assets associated with this release, please click: http://www.multivu.com/players/English/7065551-kla-tencor-introduces-inspection-review ...

Films made of semiconductor nanocrystals — tiny crystals measuring just a few billionths of a meter across — are seen as a promising new material for a wide range of applications. Nanocrystals could ...

May 22, 2014. KLA-Tencor has announced the Teron SL650, a new reticle quality-control solution for IC fabs that supports 20-nm design nodes and beyond. With 193-nm illumination and multiple STARlight ...

In this section, the manufacturing requirements associated with advanced semiconductor lithography are discussed. This is followed by a discussion of lithographic approaches being used or being ...

Leading chipmakers TSMC and Samsung are producing 5nm devices in high volume production and TSMC is forging ahead with plans for first 3nm silicon by year end. But to meet such aggressive targets, ...